用于卫星应用的Lg=70 nm AlGaN/GaN HEMT分析

Four Imane, Kameche Mohammed
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引用次数: 1

摘要

先进的氮化镓HEMT技术以其宽带隙、高电子迁移率和高击穿电压的特点,使氮化镓成为卫星应用领域的有力竞争对手。本文报道了一种基于4H-Sic衬底的AlGaN/GaN高电子迁移率晶体管结构。该结构的阈值电压VTH= - 4V,电流约为500 mA,最大跨导约为160 mS / mm,截止频率为79 GHz,最大频率约为125 GHz, GMA约为119 dB, Ion/Ioff为5.1010。对高开关速度的要求促使晶体管向具有高电子迁移率和电子输运特性的方向发展,以满足高频、低噪声和高功率密度应用的需要,这使得所提出的HEMT具有出色的直流性能,是这些应用的绝佳候选者。利用SILVACO TCAD工具进行仿真。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of AlGaN/GaN HEMT with Lg=70 nm for Satellite application
The advanced GaN HEMT technology has made GaN a good rival in satellite application because of his wide bandgap, high electron mobility and high breakdown voltage. In this paper, we report an AlGaN/GaN high electron mobility transistor structure with 4H-Sic substrate. The proposed structure shows a threshold voltage VTH=−4V, the current is about 500 mA, and maximum transconductance about 160 mS / mm. The cut-off frequency is 79 GHz and the value of max frequency is approximately of 125 GHz with GMS, GMA about 119 dB and the Ion/Ioff is 5.1010. The requirement for high switching speed has driven transistors to evolve to have high electron mobility and electron transport characteristics meeting the needs of high frequency, low noise, and high-power density applications which makes the outstanding DC performance of the proposed HEMT a splendid candidate for these applications. The simulations were done by using SILVACO TCAD tools.
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