{"title":"摆动旋转运动改善反应溅射沉积中颗粒厚度和入射角的均匀性","authors":"M. Akiba","doi":"10.1364/OIC.2019.WD.4","DOIUrl":null,"url":null,"abstract":"On reactive magnetron sputtering, we developed swinging rotation motion. It improves uniformities of thickness and incident angles of particles. The uniformities and the area size are easily adjustable with the range of the swinging motion.","PeriodicalId":119323,"journal":{"name":"Optical Interference Coatings Conference (OIC) 2019","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Improvement of uniformities of thickness and incident angles of particles by swinging rotation motion on reactive sputtering deposition\",\"authors\":\"M. Akiba\",\"doi\":\"10.1364/OIC.2019.WD.4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"On reactive magnetron sputtering, we developed swinging rotation motion. It improves uniformities of thickness and incident angles of particles. The uniformities and the area size are easily adjustable with the range of the swinging motion.\",\"PeriodicalId\":119323,\"journal\":{\"name\":\"Optical Interference Coatings Conference (OIC) 2019\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-06-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Interference Coatings Conference (OIC) 2019\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/OIC.2019.WD.4\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Interference Coatings Conference (OIC) 2019","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/OIC.2019.WD.4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Improvement of uniformities of thickness and incident angles of particles by swinging rotation motion on reactive sputtering deposition
On reactive magnetron sputtering, we developed swinging rotation motion. It improves uniformities of thickness and incident angles of particles. The uniformities and the area size are easily adjustable with the range of the swinging motion.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
