最小化反射损耗的纳米光栅结构的入射光角度分析

N. Das, K. Charoenpitaks, S. Islam
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引用次数: 4

摘要

亚波长光栅(SWG)结构由于能够减少砷化镓太阳能电池的反射损失而成为一种优良的抗反射(AR)涂层。SWG结构允许折射率逐渐变化,与平面薄膜结构相比,这证实了一种出色的AR涂层和光捕获性能。采用时域有限差分(FDTD)方法模拟了砷化镓太阳能电池中SWG结构的反射损耗。时域有限差分仿真结果表明,入射角的微小变化会影响所有纳米光栅结构的反射损耗。仿真结果还证实,当光栅高度大于300 nm时,纳米光栅结构的反射损失在~±5°入射角公差范围内保持最佳,从而使反射损失最小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of incident light angles on nano-grating structure for minimizing reflection losses in GaAs solar cells
Subwavelength grating (SWG) structures make an excellent alternative antireflective (AR) coating due to its capacity to reduce the reflection losses in GaAs solar cells. The SWG structures allow the gradual change in refractive index that confirms an excellent AR coating and the light trapping properties when compare with planar thin film structures. Finite-difference time domain (FDTD) method is used to simulate the reflection losses of the SWG structure in GaAs solar cells. The FDTD simulation results show that the slightly change of incident angle affect the reflection losses of all nano-grating structure. The simulation results also confirmed that the reflection loss of nano-grating structure maintained optimum within ~±5° of incident angle tolerance for the grating height over 300-nm for minimizing the reflection losses in GaAs solar cells.
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