利用热反射热成像技术对先进微电子器件进行热分析

D. Kendig, A. Tay, A. Shakouri
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引用次数: 8

摘要

随着当今先进设备功能的不断缩小和设备复杂性的不断增加,全面了解设备热行为的挑战也越来越大。同时,在更高的功率密度下,充分了解器件的静态和动态热行为对于确保性能和器件可靠性之间的最佳权衡至关重要。基于热反射原理的热成像可以提供亚微米级的空间分辨率和皮秒级的时间分辨率,从而满足这些先进器件所带来的挑战。本文将描述这种热成像概念,并与传统成像技术进行比较。几个案例研究将进一步说明热反射技术用于热成像的优势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thermal analysis of advanced microelectronic devices using thermoreflectance thermography
Shrinking features and growing device complexity with today's advanced devices has led to increased challenges of gaining a full understanding of device thermal behavior. At the same time, with higher power densities having a full understanding of the device static and dynamic thermal behavior is essential for ensuring optimal tradeoffs between performance and device reliability. Thermal imaging based on the Thermoreflectance Principle can meet the challenges imposed by these advanced devices by providing sub-micron spatial resolution and temporal resolution in the picosecond range. This thermal imaging concept will be described in this paper and compared to traditional imaging techniques. Several case studies will be presented to further illustrate the advantages of the thermoreflectance technique for thermal imaging.
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