硅纳米器件和单电子器件

Y. Takahashi, Y. Ono, A. Fujiwara, K. Nishiguchi, H. Inokawa
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引用次数: 2

摘要

近年来CMOS LSI制造技术的进步使纳米级硅器件的实现成为可能。该器件应与CMOS晶体管一起工作,以有效地利用高精密的CMOS技术。为了实现高功能,特别是使用硅作为基底,困难在于使相干长度足够长于器件尺寸。另一个候选是单电子晶体管(SET),它不使用相干性。该装置通过库仑封锁来操纵单个电子。利用Si MOS工艺制造集态晶体管是一种有效的方法,因为它与MOSFET相结合。这可以强调set的特殊功能,如多值操作和高电压增益。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Silicon nano-devices and single-electron devices
Recent progress in CMOS LSI fabrication technology made possible to achieve nanometre-size silicon device. The devices should operate with CMOS transistors to efficiently use high sophisticated CMOS technologies. To achieve high functionality, especially using silicon as a base the difficulty arises in making the coherent length sufficiently longer than the device size. Another candidate is a single-electron transistor (SET), which does not use coherency. The device manipulates a single electron by means of a Coulomb blockade. Fabricating SETs using Si MOS process has been useful in overcoming because SETs were combined with MOSFET. This allows to emphasize the special functionality of SETs like multiple-valued operation, and high voltage gain.
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