低温生长p-i-n行波光电探测器的亚皮秒(570秒)响应

Y. Chiu, S. Fleischer, J. Bowers
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引用次数: 2

摘要

行波光电探测器(TWPD)已显示出高速、高效的性能[1,2]。通过分配RC单元并匹配微波和光学速度,RC时间常数不再是带宽限制因素。此外,效率和带宽之间的权衡,传统的垂直光电探测器不可避免的,可以消除。低温生长(LTG) GaAs材料已广泛应用于高速光电探测器[3,4]。由于LTG-GaAs材料的载流子寿命短,可以很容易地提高探测器的带宽。对于这种探测器,脉冲响应不再受载流子传递时间的限制,而是受载流子复合时间的限制。在这项工作中,我们在p-i-n行波光电探测器(TWPD)中加入了LTG-GaAs吸收层。结果表明,利用LTG-GaAs的短载流子寿命和TWPD的高带宽效率产品可以提高器件的性能。图1显示了器件的结构(上)和波导的截面(下)。层(图1底部)在MBE系统中生长。LTG-GaAs吸收层(170 nm)在215℃下生长,衬底随后在590℃下原位退火10分钟。nand播放器在570℃下沉积,器件的制造遵循标准的p-i-n光电探测器工艺[11]。在探测器上纺上聚酰亚胺层进行钝化。采用共面波导(CPW)金属化技术连接n&p触点。采用泵浦-探头电光(EO)采样法测量电脉冲响应。对于光激发,我们使用了来自800 nm的锁模Tisapphire激光器的100 fs脉冲。在光波导中进行边缘耦合后,通过激发LTG GaAs层中的光载流子产生光电流。在CPW线的顶部放置一个小的LiTaO晶体来探测信号的时间演变。如图2所示,所测脉冲响应的频宽为570 fs,对应的-3dB带宽为520 GHz。测得外直流量子效率为8%。为了进一步研究器件的性能,进行了仿真。分布光电流由沿p-i-n区域传播的光波激发[5]。在光电探测器的输出端,电波被收集起来。有三个因素会影响脉冲响应。LTGaAs中的快速载流子复合、光波与电波的速度失配以及微波损耗
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Subpicosecond (570 fs) Response Of p-i-n Traveling Wave Photodetector Using Low-temperature -grown
Traveling wave photodetectors (TWPD) have shown high-speed and highefficiency performance [1,2]. By distributing the RC elements and matching the microwave and optical velocities the RC time constant is no longer the bandwidth-limiting factor. Moreover, the trade-off between efficiency and bandwidth, inevitable for conventional vertical photodetectors, can be eliminated. Low-temperature-grown (LTG) GaAs material has been widely utilized for high speed photodetectors [3,4]. The detector bandwidth can easily be improved due to the short carrier life time of the LTG-GaAs material. For such detectors the impulse response is no longer limited by the carrier transit time but by the much shorter carrier recombination time. In this work, we incorporated a LTG-GaAs absorption layer in a p-i-n traveling wave photodetector (TWPD). The device was successfully fabricated and our results show that the performance can be enhanced by taking advantage of both the short carrier lifetime of LTG-GaAs and the high bandwidth efficiency product of a TWPD. Figure 1 shows the structure of the device (top) and the cross section of waveguide (bottom). The layers (bottom of fig. 1) were grown in a MBE system. The LTG-GaAs absorption layer (170 nm) was grown at 215 "C, and the substrate was subsequently insitu annealed at 590 "C for 10 minutes. The nand players were deposited at 570 "C. The device fabrication followed standard p-i-n photodetector processing [ 11. A polyimide layer was spun on the detector for passivation. Coplanar waveguide (CPW) metalization was used for connection to the nand pcontacts. The electrical impulse response was measured by pump-probe electro-optic (EO) sampling. For the optical excitation we used 100 fs pulses from a modelocked Tisapphire laser operating at 800 nm. After edge-coupling into the optical waveguide, the photocurrent is generated by exciting photocarriers in the LTG GaAs layer. A small LiTaO, crystal was placed on top of the CPW lines to probe the time evolution of the signal. As shown in fig. 2, the FWHM of the measured impulse response is 570 fs, corresponding to a -3dB bandwidth of 520 GHz. A external D.C. quantum efficiency of 8% was measured. Simulations have been performed to further study the device performance. The distributed photocurrent is excited by the optical wave propagating along in the p-i-n region [ 5 ] . At the output of the photodetector, the electrical wave is collected. There are three factors that will effect the impulse response. The fast carrier recombination in the LTGaAs, the velocity mismatch between optical and electrical waves, and the microwave loss
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