带亚波长光栅反射器的可调谐法布里-波干涉仪,用于MWIR微光谱仪

SPIE OPTO Pub Date : 2016-04-01 DOI:10.1117/12.2213647
M. Meinig, S. Kurth, M. Seifert, K. Hiller, J. Wecker, M. Ebermann, N. Neumann, T. Gessner
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引用次数: 3

摘要

本文介绍了基于亚波长光栅(SWG)反射器的可调谐法布里-波干涉仪(FPI)的设计和制造的最新进展,以及测量结果和应用。FPI被设计为高度小型化的中波红外光谱仪的波长选择元件。FPI的光学谐振器建在两个高反射镜之间。反射镜集成在支持MEMS结构中,具有一个静电移动和一个固定反射镜载体。FPI是在晶圆级上由两个硅衬底采用批量微加工工艺制备的。基板用中间的SU-8层粘合在一起。反射器由铝亚波长光栅制成,通过纳米压印光刻技术在薄的LP-Si3N4膜上结构。亚波长结构在一定的光谱范围内建立了高反射率和低吸光度的频率选择性表面。利用三维电磁频域求解器对设计进行了有限元仿真和优化。仿真结果与实测结果的比较与制作的反射器和fpi的测量结果吻合得很好。fpi用于5级干扰,可在3.5 μm到2.9 μm之间进行电调谐。测得的最大透过率在70% ~ 50%之间,测得的频宽小于50 nm。新的亚波长光栅反射器可以集成在MEMS批量工艺中,比以前使用的介电层堆叠反射器更具成本效益。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Tunable Fabry-Pérot interferometer with subwavelength grating reflectors for MWIR microspectrometers
This report presents recent advances in the design and fabrication of a tunable Fabry-Pérot interferometer (FPI) with subwavelength grating (SWG) reflectors, as well as measurement results and applications. The FPI is designed as wavelength selecting element for highly miniaturized mid-wave infrared spectrometers. The optical resonator of the FPI is built between two highly reflecting mirrors. The mirrors are integrated in a supporting MEMS structure with one electrostatically movable and one fixed mirror carrier. The FPI is fabricated in a bulk micromachining batch process on wafer level from two silicon substrates. The substrates are bonded together with an intermediate SU-8 layer. The reflectors are made of aluminum subwavelength gratings, structured on a thin LP-Si3N4 membrane by nanoimprint lithography. The subwavelength structures build a frequency selective surface with high reflectance and low absorbance in a defined spectral range. Simulations and optimization of the design were done using finite element method with a 3D EM frequency domain solver. Comparison of simulation results and measurements of fabricated reflectors and FPIs are in very good agreement. The FPIs are used in the 5th interference order and can be tuned from 3.5 μm to 2.9 μm electrically. The measured maximum transmittance is between 70 % and 50 % and the measured FWHM bandwidth is lower than 50 nm. The new subwavelength grating reflectors can be integrated in a MEMS batch process more cost-efficient than previously used reflectors of dielectric layer stacks.
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