F. Namavar, E. Cortesi, N. Kalkhoran, J. Manke, B. Buchanan
{"title":"低能SIMOX (LES)结构的表征","authors":"F. Namavar, E. Cortesi, N. Kalkhoran, J. Manke, B. Buchanan","doi":"10.1109/SOSSOI.1990.145704","DOIUrl":null,"url":null,"abstract":"Formation of ultra-thin SOI material using the SIMOX process is addressed. Research has been carried out to determine the effect of total dose, dose step, dose rate, implantation temperature, and energy on the formation of ultra-thin SIMOX material. Attempts were made to determine the lowest energy possible for the implantation of oxygen which results in the formation of high quality, thin SIMOX material. All samples were annealed at 1300 degrees C for 6 h in N/sub 2/ and analyzed using a variety of techniques, including TEM. The electrical properties of the LES samples were characterized and compared with those of standard SIMOX samples. An empirical curve of voltage breakdown versus oxide thickness for both LES and standard SIMOX samples was developed. The results show the formation of high quality SOI structures by oxygen implantation at 20-80 keV.<<ETX>>","PeriodicalId":344373,"journal":{"name":"1990 IEEE SOS/SOI Technology Conference. Proceedings","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Characterization of low energy SIMOX (LES) structures\",\"authors\":\"F. Namavar, E. Cortesi, N. Kalkhoran, J. Manke, B. Buchanan\",\"doi\":\"10.1109/SOSSOI.1990.145704\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Formation of ultra-thin SOI material using the SIMOX process is addressed. Research has been carried out to determine the effect of total dose, dose step, dose rate, implantation temperature, and energy on the formation of ultra-thin SIMOX material. Attempts were made to determine the lowest energy possible for the implantation of oxygen which results in the formation of high quality, thin SIMOX material. All samples were annealed at 1300 degrees C for 6 h in N/sub 2/ and analyzed using a variety of techniques, including TEM. The electrical properties of the LES samples were characterized and compared with those of standard SIMOX samples. An empirical curve of voltage breakdown versus oxide thickness for both LES and standard SIMOX samples was developed. The results show the formation of high quality SOI structures by oxygen implantation at 20-80 keV.<<ETX>>\",\"PeriodicalId\":344373,\"journal\":{\"name\":\"1990 IEEE SOS/SOI Technology Conference. Proceedings\",\"volume\":\"27 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-10-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1990 IEEE SOS/SOI Technology Conference. Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOSSOI.1990.145704\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1990 IEEE SOS/SOI Technology Conference. Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOSSOI.1990.145704","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Characterization of low energy SIMOX (LES) structures
Formation of ultra-thin SOI material using the SIMOX process is addressed. Research has been carried out to determine the effect of total dose, dose step, dose rate, implantation temperature, and energy on the formation of ultra-thin SIMOX material. Attempts were made to determine the lowest energy possible for the implantation of oxygen which results in the formation of high quality, thin SIMOX material. All samples were annealed at 1300 degrees C for 6 h in N/sub 2/ and analyzed using a variety of techniques, including TEM. The electrical properties of the LES samples were characterized and compared with those of standard SIMOX samples. An empirical curve of voltage breakdown versus oxide thickness for both LES and standard SIMOX samples was developed. The results show the formation of high quality SOI structures by oxygen implantation at 20-80 keV.<>
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