空穴输运层中载流子对量子点发光器件稳定性的影响

Tyler Davidson-Hall, H. Aziz
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引用次数: 0

摘要

虽然量子点(QDs)的窄发射光谱和高量子产率对于发光器件(led)是理想的,但在将其用于高亮度应用之前,必须了解限制电致发光QDs稳定性的机制。基于cd的量子点的深能级允许相对容易的电子注入,但相对困难的空穴注入,导致发射层(EML)中载流子的不平衡,从而通过非辐射重组降低效率。在级联HTL (CHTL)结构中加入由顺序较高的最高已占据分子轨道(HOMO)能级的材料组成的多组分空穴传输层(HTL),可以将QDLED的寿命提高20倍,同时提高发光效率。及时和延迟的电学和光谱测量表明,CHTL结构将过量的空穴积累从QD/HTL界面移开,导致与QD EML接触的HTL降解较少,并通过阻止电子向阳极的传递来减少泄漏电流。HTL中的激子密度与QDLED的效率和稳定性之间的权衡突出了HTL在长期设备性能中的重要性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The influence of charge carriers in the hole transport layer on stability of quantum dot light-emitting devices
While the narrow emission spectrum and high quantum yield of quantum dots (QDs) is desirable for light emitting devices (LEDs), the mechanisms that limit electroluminescent QDLED stability must be understood before they can be used in high brightness applications. The deep energy levels of Cd-based QDs allow for relatively easy electron injection but comparably difficult hole injection, resulting in an imbalance of charge carriers in the emission layer (EML) that can reduce efficiency via non-radiative recombination. The incorporation of a multi-component hole transport layer (HTL) consisting of materials with sequentially deeper highest occupied molecular orbital (HOMO) energy levels in a cascading HTL (CHTL) architecture has been shown to improve QDLED lifetime by 20x while also enhancing luminous efficiency. Prompt and delayed electrical and spectroscopic measurements indicate that the CHTL structure shifts excessive hole accumulation away from the QD/HTL interface, resulting in less degradation of the HTL in contact with the QD EML, and reduces leakage current by blocking electron transport to the anode. The trade-off between exciton density in the HTL vs. QDLED efficiency and stability highlights the importance of the HTL in long-term device performance.
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