用于XUV投影光刻的60nm自由电子激光器的概念设计*

Soft-X-Ray Projection Lithography Pub Date : 1900-01-01 DOI:10.1364/sxray.1992.pd1

R. Sheffield, B. Carlsten, K. C. Dominic Chan, J. Goldstein, M. Lynch, B. Newnam, D. Nguyen, D. Prono, R. Warren

{"title":"用于XUV投影光刻的60nm自由电子激光器的概念设计*","authors":"R. Sheffield, B. Carlsten, K. C. Dominic Chan, J. Goldstein, M. Lynch, B. Newnam, D. Nguyen, D. Prono, R. Warren","doi":"10.1364/sxray.1992.pd1","DOIUrl":null,"url":null,"abstract":"We present the design and calculated performance for a 20-W XUV-FEL source for 60-nm projection lithography. The compact design features an 85-MeV rf linear accelerator with photoinjector, and a pulsed microwiggler with multifacet resonator optics.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"142 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Conceptual Design Of a 60-nm Free-Electron Laser for XUV Projection Lithography*\",\"authors\":\"R. Sheffield, B. Carlsten, K. C. Dominic Chan, J. Goldstein, M. Lynch, B. Newnam, D. Nguyen, D. Prono, R. Warren\",\"doi\":\"10.1364/sxray.1992.pd1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present the design and calculated performance for a 20-W XUV-FEL source for 60-nm projection lithography. The compact design features an 85-MeV rf linear accelerator with photoinjector, and a pulsed microwiggler with multifacet resonator optics.\",\"PeriodicalId\":409291,\"journal\":{\"name\":\"Soft-X-Ray Projection Lithography\",\"volume\":\"142 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soft-X-Ray Projection Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/sxray.1992.pd1\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1992.pd1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

摘要

本文介绍了一种用于60nm投影光刻的20w XUV-FEL光源的设计和计算性能。紧凑的设计包括一个85-MeV的带光注入器的rf直线加速器和一个带多面谐振腔光学的脉冲微摆动器。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Conceptual Design Of a 60-nm Free-Electron Laser for XUV Projection Lithography*

We present the design and calculated performance for a 20-W XUV-FEL source for 60-nm projection lithography. The compact design features an 85-MeV rf linear accelerator with photoinjector, and a pulsed microwiggler with multifacet resonator optics.

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Soft-X-Ray Projection Lithography

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