InP:Fe中电子-空穴竞争——多重缺陷的作用

R. S. Rana, D. Nolte
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引用次数: 0

摘要

目前在许多半绝缘III-V型化合物半导体中已经发现并研究了光折变效应[1]。一般来说,单缺陷模型(SDM)可以很好地描述一种或两种类型的载流子。然而,由于存在额外的缺陷,理论和实验结果之间存在差异。在理解多重深度缺陷在光折变效应中的作用时,温度起着关键的作用。每个不同的缺陷在材料的带隙内都有一个特定的能量位置。缺陷位置载流子的热发射是缺陷能量和样品温度的强(指数)函数。通过监测两波混频(2WM)增益和四波混频(4WM)衍射效率随温度的变化,可以研究非平衡缺陷占位的热弛豫及其对光折变效应的影响,为表征材料提供了一种天然的工具。我们发现InP:Fe中的多个缺陷水平会导致其光折变行为的剧烈变化。室温下报告的增益降低可以证明是由InP中除孤立铁之外的另一个缺陷引起的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electron-Hole Competition in InP:Fe -- The Role of Multiple Defects
The photorefractive effect has now been identified and studied in many semi-insulating III-V compound semiconductors [1]. In general, it can be well described by a Single Defect Model (SDM) with one or two types of charge carriers. However, discrepancies arise between theory and the experimental results due to the presence of additional defects. In understanding the role of multiple deep defects in the photorefractive effect, temperature plays a key role. Each different defect has a specific energy position within the bandgap of the material. Thermal emission of carriers trapped at defect sites is a strong (exponential) function of defect energy and the sample temperature. The thermal relaxation of nonequilibrium defect occupancies, and the subsequent effect on the photorefractive effect, can be studied by monitoring the two-wave mixing (2WM) gain and four-wave mixing (4WM) diffraction efficiency as functions of temperature, providing a natural tool to characterize the material. We find that multiple defect levels in InP:Fe lead to dramatic changes in the photorefractive behavior. Reduced gain reported at room temperature can be shown to arise from an additional defect in InP other than isolated Fe.
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