氧化钒薄层在太赫兹器件中的应用

M. Medvedev, A. Oleynik
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引用次数: 0

摘要

提出了氧化钒(VOx)薄层的应用领域。在接近68℃的温度下,它在绝缘状态和导电(金属)状态之间具有快速,可逆的金属-绝缘体转变(MIT)。VOx中的MIT伴随着其电学和光学特性的显着变化,这些变化跨越了从直流到微波,太赫兹(THz),红外(IR)和可见辐射的几个频域。这种转变可以由热、电、光甚至强太赫兹场触发。在本文中,作者证明了VOx薄层在可切换太赫兹器件、热测量太赫兹器件和太赫兹成像仪方面具有很好的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Application of Thin Layer of Vanadium Oxide in Terahertz Range Devices
The paper is concerned field of application of vanadium oxide (VOx) thin layer was proposed. It has a fast, reversible metal-insulator transition (MIT) between an insulating state and a conducting (metallic) state, at temperatures near to 68 C. The MIT in VOx is accompanied by significant changes in its electrical and optical properties which are spanning over several frequency domains from dc to microwave, terahertz (THz), infrared (IR), and visible radiation. The transition can be triggered by thermal, electrical, optical, and even strong THz fields. In this paper, the authors showed that VOx thin layer shows promising potential for switchable THz devices, bolometric THz devices and THz imager.
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