通过同时进行基于物理的x参数和电磁模拟的PA变率全球评估

S. Guerrieri, C. Ramella, F. Bonani, G. Ghione
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引用次数: 1

摘要

在[1]中引入的新技术被用于解决GaAs MMIC x波段功率放大器的全变异性分析,包括在有源和无源组件中几个技术参数的统计变化。有源器件通过x参数建模,直接从基于物理的分析中提取。非50 Ω X-Par模型用于考虑输入端口与传统50 Ω参考的不匹配。从精确的电磁仿真中提取被动结构的散射参数,然后通过数据交互文件(如MDIF或CITIfile)将其作为最重要的MMIC制造参数(如MIM电容器介电层厚度)的函数导入电路模拟器。分析表明,超过10%的输出功率变化可归因于传统GaAs MMIC技术中MIM和掺杂的同时变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Global Assessment of PA variability through concurrent Physics-based X-parameter and Electro-Magnetic simulations
The novel technique introduced in [1] is exploited to address a full variability analysis of a GaAs MMIC X-band power amplifier, including the statistical variations of several technological parameters, both in the active and passive components. The active device is modelled by means of X-parameters, directly extracted from physics-based analysis. A non-50 Ω X-Par model is used to take into account the input port mismatch with respect to the conventional 50 Ω reference. The scattering parameters of the passive structures are extracted from accurate electromagnetic simulations and then imported into the circuit simulator through data intercharge files (e.g. MDIF or CITIfile) as a function of the most important MMIC fabrication parameters, e.g. the thickness of the MIM capacitor dielectric layer. The analysis shows that more than 10% of output power variations can be ascribed to the concurrent MIM and doping variations in conventional GaAs MMIC technology.
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