生长后热退火对mbe生长InAlGaAs/GaAs量子点的影响

Riazul Arefin, Seunghyun Lee, Hyemin Jung, J. Ha, Weicheng You, Arnob Ghosh, Md. Saiful Islam Sumon, J. S. Kim, S. Krishna, S. Arafin
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引用次数: 0

摘要

生长的第四系InAlGaAs/GaAs量子点(QDs)达到了5 × 1010 cm−2的发射波长,在20 K时达到了77 meV的FWHM。经过快速热退火(RTA)处理后,量子点的光学性能得到了显著改善,集成光致发光(PL)强度提高了2倍,FWHM降至29 meV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of Post-growth Thermal Annealing on MBE-grown InAlGaAs/GaAs Quantum Dots
Quaternary InAlGaAs/GaAs quantum dots (QDs) were grown to achieve emission at <1 μm and the effects of post-growth thermal annealing on the optical and morphological properties were experimentally investigated. A QD density as high as > 5 × 1010 cm−2 and FWHM of 77 meV at 20 K are achieved for the as-grown QD ensemble. After the rapid thermal annealing (RTA) treatment, remarkable improvements in the optical properties of the QDs are observed as the integrated photoluminescence (PL) intensity improves by a factor of 2 and the FWHM reduces to 29 meV.
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