薄膜凝结的一个模型

Proceedings of 17th International Symposium on Discharges and Electrical Insulation in Vacuum Pub Date : 1996-07-21 DOI:10.1109/DEIV.1996.545504

G.I. Kostiouk, I. Levchenko

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引用次数: 1

摘要

为了研究薄膜的生长规律，并计算薄膜的显微硬度、粗糙度、孔隙率等重要特性，建立了薄膜凝结模型。我们的模型允许计算薄膜结构，并定义了上述特性。此外，该模型适用于计算薄膜具有一定结构所需的条件。该模型考虑了表面上所有最重要的过程。通过计算实验，得到了一些非常有趣的结果。

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A model of thin film condensation

A model of thin film condensation have been developed to investigate the film growth regularity and calculate the most important characteristics of thin coating, such as microhardness, roughness, porosity etc. Our model allows calculation of film structure and defines the above-mentioned characteristics. Besides, the model is suitable for calculation of the conditions needed for a film to have a certain structure. The model takes into account all the most important processes on the surface. Some very interesting results were obtained by means of computing experiments.

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Proceedings of 17th International Symposium on Discharges and Electrical Insulation in Vacuum

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