平面光学元件高精度铣削设备优化技术研究

Jinfeng Bai, Huiying Zhao, Shenggen Zhu, Lingyu Zhao, Mingchen Cao, D. Ma, Yuxuan Cao, Jianjun Chen
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引用次数: 0

摘要

在平面光学元件高精度加工要求的背景下,对四轴专用铣削设备进行了总体结构设计,确定了设备部件的基本材料。为对平面光学元件进行高精度、高效率加工的牵引,对设备的运动部件进行精密分配,设计了设备模型。在设备模型的两种极限状态下进行了静态仿真分析,对基本设计模型和优化设计模型进行了比较。在中间加工状态下,将基本设计模型的加工点和驱动部分的变形量分别从0.298微米和0.20微米优化到最优设计模型的0.172微米和0.155微米。将基本设计模型的加工点和传动部分的变形分别从0.301微米和0.197微米优化到最优设计模型的0.197微米和0.201微米。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Research on optimization technology of high precision milling equipment for planar optical elements
Under the background of high precision machining requirements for planar optical elements, the overall structure design of four-axis special milling equipment was made, and the basic materials of equipment components were set. The precision distribution of the moving parts of the equipment is carried out for the traction of the plane optical element with high precision and high efficiency machining, so the equipment model is designed. The static simulation analysis was carried out in the two limit states of the equipment model, the basic design model and the optimal design model were compared. In the intermediate processing state, the deformation of the processing point and the driving part of the basic design model was optimized from 0.298 micron and 0.20 micron to 0.172 micron and 0.155 micron of the optimal design model respectively. The deformation of the processing point and the transmission part of the basic design model was optimized from 0.301 micron and 0.197 micron to 0.197 micron and 0.201 micron of the optimal design model, respectively.
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