I. Susanto, I. Yu, Dianta Mustofa Kamal, Belyamin, F. Zainuri, S. Permana, Chi-Yu Tsai, Y. Ho, P. Tsai
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引用次数: 0
摘要
采用等离子体辅助分子束外延的方法,对在MoS 2层上生长的氮化镓(GaN)薄膜的表面结构进行了全面的分析。利用扫描电子显微镜(SEM)研究了氮化镓薄膜的表面形貌。在氮化镓薄膜上形成了具有一定数量的镓粒子的光滑表面。用XPS核能级(CL)三维Ga在GaN薄膜中发现了超过80%的Ga- n键元素。此外,通过原子力显微镜(AFM)研究表面轮廓的结果表明,在扫描区域3 x 3µm时,表面纹理更光滑,RMS为2.17 nm。最后,衬底生长温度越高,表面越光滑,镓金属含量越低。
Surface Texture of Thin Gallium Nitride Grown on Closed to Van Der Wall Layer of Molybdenum Disulfide
: A comprehensive analysis of surface texture of gallium nitride (GaN) films grown on the MoS 2 layer via plasma-assisted molecular beam epitaxy was performed. Scanning electron microscopy (SEM) was used to explore the surface morphology of GaN films. The smooth surface with attending the amount of Ga particle created on the GaN films. The great of Ga-N bonding elements more than 80 % explored by XPS core level (CL) 3d Ga was also obtained in the GaN films. Moreover, investigating the results of surface contour by atomic force microscopic (AFM) exhibited a smoother surface texture with RMS of 2.17 nm for scan area 3 x 3 µm. Finally, the higher growth temperature served by substrate could facilitate the smoother surface with the minimum of Ga metallic.