由于原始的无介电介质设计和创新的工艺流程,制造了坚固可靠的RF-MEMS开关

F. Souchon, B. Reig, C. Dieppedale, H. Sibuet, B. Blampey, J. Duchamp
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引用次数: 4

摘要

由于可靠性问题,RF-MEMS开关的大规模集成仍然受到威胁。为了克服这一挑战,本文提出了一种新型的静电驱动MEMS开关。这种新颖的开关集成了一个新的设计:一方面是一个无介电致动器,以大幅度减少介电充电;另一方面,氮化硅悬索桥的对称堆叠使其具有对热应力不敏感的开关行为。除此之外,还对工艺流程进行了全面的审查,以便更好地控制不同的间隙高度,并减少接触面污染。其中,热氧化和湿蚀刻工艺被用于制造开关的下部,非晶硅被用作牺牲层。最后,这些主要的发展已经证明了在处理能力,微波性能和寿命方面的显著成果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A robust and reliable RF-MEMS switch fabricated thanks to an original dielectric free design and an innovative process flow
Massive integration of RF-MEMS switches is still jeopardized due to reliability issues. To overcome this challenge, this contribution presents a novel electrostatically-actuated MEMS switch. This novel switch integrates a new design: on the one hand a dielectric free actuator on order to reduce drastically the dielectric charging; and on the other hand a symmetrical stacking of the silicon nitride suspended bridge in order to have a switch behavior insensitive to thermal stresses. In addition to that, the process flow has been totally reviewed so as to better control the different gap heights and also reduce contact surface contamination. Among others, thermal oxidations and wet etchings processes are used to fabricate the lower parts of the switch, and amorphous silicon is used as sacrificial layer. Finally, these major evolutions have allowed to demonstrate remarkable results in terms of process capability, microwave performances and lifetime.
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