{"title":"聚焦离子束光刻技术研究无机抗蚀剂在0.1-/spl μ m以下的图案特征","authors":"S. Paek, Soo‐Ho Park, Hyun-Yong Lee, H. Chung","doi":"10.1109/IMNC.1998.730007","DOIUrl":null,"url":null,"abstract":"Every year, m and more, many Focused-ion-be characteristics of various importan we anticipate tha lon-bcan litho] for sub-0.lpm ell patterns or mas1 obtain a clear-an water vapors as development is i the undercutting recently present< Carlo(MC) simL penetration into In previous F characteristics, ti exposure and by duality according on the energy dj case of RIE dev The Zmin optir resists, respectiv ,?,,,-thick inorga Though these process, high c( sensitivity 1-2 ( be solved, espec As one study the columnar-sti development. Tl15C-6-18","PeriodicalId":356908,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)","volume":"42 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-07-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Sub-0.1-/spl mu/m Patterning Characteristics of Inorganic Resists by Focused-Ion-Beam Lithography\",\"authors\":\"S. Paek, Soo‐Ho Park, Hyun-Yong Lee, H. Chung\",\"doi\":\"10.1109/IMNC.1998.730007\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Every year, m and more, many Focused-ion-be characteristics of various importan we anticipate tha lon-bcan litho] for sub-0.lpm ell patterns or mas1 obtain a clear-an water vapors as development is i the undercutting recently present< Carlo(MC) simL penetration into In previous F characteristics, ti exposure and by duality according on the energy dj case of RIE dev The Zmin optir resists, respectiv ,?,,,-thick inorga Though these process, high c( sensitivity 1-2 ( be solved, espec As one study the columnar-sti development. Tl15C-6-18\",\"PeriodicalId\":356908,\"journal\":{\"name\":\"Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)\",\"volume\":\"42 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-07-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMNC.1998.730007\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.1998.730007","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Sub-0.1-/spl mu/m Patterning Characteristics of Inorganic Resists by Focused-Ion-Beam Lithography
Every year, m and more, many Focused-ion-be characteristics of various importan we anticipate tha lon-bcan litho] for sub-0.lpm ell patterns or mas1 obtain a clear-an water vapors as development is i the undercutting recently present< Carlo(MC) simL penetration into In previous F characteristics, ti exposure and by duality according on the energy dj case of RIE dev The Zmin optir resists, respectiv ,?,,,-thick inorga Though these process, high c( sensitivity 1-2 ( be solved, espec As one study the columnar-sti development. Tl15C-6-18
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