太阳能应用的低成本薄膜沉积装置

Melissa R. Dutter, Kyle Davis, R. Spelman, Joel Groetsema, K. Hutchison, S. Holland
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引用次数: 3

摘要

太阳能技术的广泛采用,如太阳能光伏(PV)和/或光电化学(PEC)氢燃料生产电池,需要低成本的制造方法来生产大面积的太阳能收集装置。利用化学溶液沉积技术制备的新型薄膜半导体材料在降低生产和制造成本方面具有重要的潜力。詹姆斯麦迪逊大学正在进行的研究主要集中在光伏和PEC应用的薄膜半导体材料的开发和制造上。薄膜半导体,如BiVO4和Cu2ZnSnS4,是通过将液体前驱体溶液沉积到加热的衬底上,使用超声波喷雾热解、气动喷涂或液滴铸造来制造的。为了使薄膜沉积在更大的样品区域,一种自动沉积系统正在开发中。该涂层系统由两个主要和相互作用的子系统组成:运动和加热控制。运动系统控制前驱体沉积装置(如超声波喷雾喷嘴)在沉积过程中的路径和行进速度。在沉积过程中,衬底放置在加热的表面上,这提供了在衬底上诱导所需化学反应和去除不需要的化合物所需的能量。该表面具有均匀的空间温度分布,必须控制在40°C至500°C的恒定温度范围内,变异性为±4°C。为了满足这些要求,专门设计了一个加热板。这项工作的重点是设计一个集成系统,允许在詹姆斯麦迪逊大学完成16平方英寸的沉积区域。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Low-cost thin-film deposition apparatus for solar applications
Widespread adoption of solar energy technologies, such as solar photovoltaics (PV) and/or photoelectrochemical (PEC) hydrogen fuel production cells, requires low-cost fabrication methods to produce large area devices for solar energy harvesting. Novel thin-film semiconductor materials produced from chemical solution deposition have significant potential to reduce production and manufacturing costs. Ongoing research at James Madison University is focused on the development and fabrication of thin-film semiconductor materials for PV and PEC applications. Thin-film semiconductors, such as BiVO4 and Cu2ZnSnS4, are fabricated by depositing a liquid precursor solution onto a heated substrate using ultrasonic spray pyrolysis, pneumatic spraying, or liquid drop casting. To enable thin-film depositions over larger sample areas, an automated deposition system is being developed. This coating system is comprised of two primary and interacting subsystems: motion and heating control. The motion system controls the path and travel speed of the precursor deposition device, such as the ultrasonic spray nozzle, during the deposition process. During the deposition procedure, the substrates rest on a heated surface, which provides the energy necessary to induce the desired chemical reactions on the substrate and remove unwanted compounds. This surface have a uniform spatial temperature distribution and must be controlled to a constant temperature ranging from 40 °C to 500 °C with a variability of ±4 °C. A specially designed heating plate was designed to meet these requirements. The focus of this work is to design an integrated system that allows a deposition area of 16 in2 to be completed at James Madison University.
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