{"title":"在低成本集成电路工艺中提高螺旋集成电感q因子的新几何结构","authors":"N. Hosseini, H. Nabovati","doi":"10.1109/CCECE.2009.5090298","DOIUrl":null,"url":null,"abstract":"Implementation of a high quality spiral inductor on silicon substrate is a long lasting challenge for the microfabrication researchers; in this paper a new spiral inductor which is compatible with the standard IC technology is proposed. This new inductor shows more quality factor and higher resonance frequency even though the overall inductance value remains almost the constant in compare with the traditional designs. This new structure shows more improvement in the peak of quality factor as the number of turn increases.","PeriodicalId":153464,"journal":{"name":"2009 Canadian Conference on Electrical and Computer Engineering","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-05-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"New geometry for improving Q-factor of spiral integrated inductor on low cost integrated circuit process\",\"authors\":\"N. Hosseini, H. Nabovati\",\"doi\":\"10.1109/CCECE.2009.5090298\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Implementation of a high quality spiral inductor on silicon substrate is a long lasting challenge for the microfabrication researchers; in this paper a new spiral inductor which is compatible with the standard IC technology is proposed. This new inductor shows more quality factor and higher resonance frequency even though the overall inductance value remains almost the constant in compare with the traditional designs. This new structure shows more improvement in the peak of quality factor as the number of turn increases.\",\"PeriodicalId\":153464,\"journal\":{\"name\":\"2009 Canadian Conference on Electrical and Computer Engineering\",\"volume\":\"17 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-05-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 Canadian Conference on Electrical and Computer Engineering\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CCECE.2009.5090298\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 Canadian Conference on Electrical and Computer Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CCECE.2009.5090298","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
New geometry for improving Q-factor of spiral integrated inductor on low cost integrated circuit process
Implementation of a high quality spiral inductor on silicon substrate is a long lasting challenge for the microfabrication researchers; in this paper a new spiral inductor which is compatible with the standard IC technology is proposed. This new inductor shows more quality factor and higher resonance frequency even though the overall inductance value remains almost the constant in compare with the traditional designs. This new structure shows more improvement in the peak of quality factor as the number of turn increases.
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