基于物理的AlGaN/GaN HEMT器件漏极电流紧凑模型

S. Khandelwal, T. Fjeldly
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引用次数: 17

摘要

本文提出了一种基于物理的AlGaN/GaN高电子迁移率晶体管漏极电流Id的解析模型。该模型是在本课题组先前开发的二维电子气体密度分析模型的基础上发展起来的。该模型包括速度饱和、信道长度调制、短信道效应、掐断、迁移率退化和自热等重要效应。在各种器件几何形状的栅极和漏极电压的典型范围内,该模型与实验数据非常吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A physics based compact model for drain current in AlGaN/GaN HEMT devices
In this paper we present a physics based analytical model for the drain current Id in AlGaN/GaN high electron mobility transistors. The proposed model is developed based on the analytical 2-D electron gas density ns model developed previously by our group. The model includes important effects like velocity saturation, channel length modulation, short channel effect, pinch-off, mobility degradation, and self-heating. The model is in excellent agreement with the experimental data over a typical range of applied gate and drain voltages for various device geometries.
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