高压直流输电系统晶闸管阀的最新技术进展

S. Tanabe, S. Irokawa
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引用次数: 0

摘要

晶闸管阀随着晶闸管容量的增加而发展。在过去的15年里,晶闸管阀的体积已经减少到大约三分之一,功率损失减少到大约一半。然而,如果继续寻求晶闸管容量的增加,晶闸管阀的发展似乎已经达到了饱和水平。提高晶闸管的介电强度需要增加硅片厚度和电阻率。硅片厚度和电阻率的增加会增加晶闸管阀的导通损耗。通过延长硅片的载流子寿命可以降低传导损耗,从而增加阻尼电路的损耗。为了改善这种权衡关系,开发了离子辐照技术。结果表明,晶闸管特性的优化对晶闸管阀的优化具有重要意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Recent technical advancement of thyristor valve for HVDC transmission system
Thyristor valves have progressed with an increasing thyristor capacity. Over the past 15 years the volume of a thyristor valve has reduced to about one-third and power loss to about one-half. The advance of thyristor valves, however, seems to have reached a saturation level if simply an increase in the thyristor capacity continues to be sought. To increase the dielectric strength of thyristors requires increasing the silicon wafer thickness and resistivity. Increased thickness and resistivity of silicon wafer, however, increase conduction loss of a thyristor valve. The conduction loss can be reduced by prolonging the carrier life-time of silicon wafer, which in turn increases the loss of a damping circuit. For improving such a tradeoff relationship, an ion irradiation technology was developed. It is shown that optimization of thyristor characteristics is important in optimizing the thyristor valve.
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