光子器件压印过程中残余层分布

2007 Conference on Lasers and Electro-Optics - Pacific Rim Pub Date : 2007-12-04 DOI:10.1109/CLEOPR.2007.4391422

C. Choi, M. W. Lee, J. Sung, Bo-Soon Kim, Seung-Gol Lee, B. O

{"title":"光子器件压印过程中残余层分布","authors":"C. Choi, M. W. Lee, J. Sung, Bo-Soon Kim, Seung-Gol Lee, B. O","doi":"10.1109/CLEOPR.2007.4391422","DOIUrl":null,"url":null,"abstract":"We report on the behavior and effect of the residual layer left on the substrate after embossing process for the fabrication of photonic devices. The PDMS material was used as mold, and thermal and UV curable polymers was adapted for the fabrication of demultiplexer and optical power splitter, respectively.","PeriodicalId":384775,"journal":{"name":"2007 Conference on Lasers and Electro-Optics - Pacific Rim","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Residual Layer Distribution on Embossing Process for Photonic Devices\",\"authors\":\"C. Choi, M. W. Lee, J. Sung, Bo-Soon Kim, Seung-Gol Lee, B. O\",\"doi\":\"10.1109/CLEOPR.2007.4391422\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report on the behavior and effect of the residual layer left on the substrate after embossing process for the fabrication of photonic devices. The PDMS material was used as mold, and thermal and UV curable polymers was adapted for the fabrication of demultiplexer and optical power splitter, respectively.\",\"PeriodicalId\":384775,\"journal\":{\"name\":\"2007 Conference on Lasers and Electro-Optics - Pacific Rim\",\"volume\":\"29 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2007-12-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2007 Conference on Lasers and Electro-Optics - Pacific Rim\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CLEOPR.2007.4391422\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 Conference on Lasers and Electro-Optics - Pacific Rim","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOPR.2007.4391422","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

本文报道了在光子器件制造过程中，压印后在衬底上留下的残余层的行为和影响。以PDMS材料为模具，采用热固化聚合物和光固化聚合物分别制备解复用器和光功率分配器。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Residual Layer Distribution on Embossing Process for Photonic Devices

We report on the behavior and effect of the residual layer left on the substrate after embossing process for the fabrication of photonic devices. The PDMS material was used as mold, and thermal and UV curable polymers was adapted for the fabrication of demultiplexer and optical power splitter, respectively.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2007 Conference on Lasers and Electro-Optics - Pacific Rim

自引率

0.00%

发文量