采用32nm CMOS技术设计的电流模放大器的布局寄生效应对其性能的影响

Y. Hristov, Simeon Dimitrov Kostadinov, D. Gaydazhiev, I. Uzunov
{"title":"采用32nm CMOS技术设计的电流模放大器的布局寄生效应对其性能的影响","authors":"Y. Hristov, Simeon Dimitrov Kostadinov, D. Gaydazhiev, I. Uzunov","doi":"10.1109/ET.2018.8549671","DOIUrl":null,"url":null,"abstract":"This paper investigates the influence of layout parasitic RC elements on the main parameters of a current mode amplifier designed in deep sub-micron CMOS technology - 32nm bulk CMOS process. Three distinct layout designs of the same amplifier circuit are implemented and compared by re-simulation. The effect of parasitic elements is investigated and estimated in the most appropriate layout. The statistical distribution of the main amplifier parameters due to process variation is received by Monte Carlo analysis.","PeriodicalId":374877,"journal":{"name":"2018 IEEE XXVII International Scientific Conference Electronics - ET","volume":"95 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Influence of the Layout Parasitic Effects on the Performance of Current Mode Amplifier Designed Using 32nm CMOS Technology\",\"authors\":\"Y. Hristov, Simeon Dimitrov Kostadinov, D. Gaydazhiev, I. Uzunov\",\"doi\":\"10.1109/ET.2018.8549671\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper investigates the influence of layout parasitic RC elements on the main parameters of a current mode amplifier designed in deep sub-micron CMOS technology - 32nm bulk CMOS process. Three distinct layout designs of the same amplifier circuit are implemented and compared by re-simulation. The effect of parasitic elements is investigated and estimated in the most appropriate layout. The statistical distribution of the main amplifier parameters due to process variation is received by Monte Carlo analysis.\",\"PeriodicalId\":374877,\"journal\":{\"name\":\"2018 IEEE XXVII International Scientific Conference Electronics - ET\",\"volume\":\"95 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 IEEE XXVII International Scientific Conference Electronics - ET\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ET.2018.8549671\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE XXVII International Scientific Conference Electronics - ET","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ET.2018.8549671","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文研究了布局寄生RC元件对深亚微米CMOS工艺设计的电流模式放大器主要参数的影响。对同一放大器电路的三种不同布局设计进行了实现,并通过再仿真进行了比较。在最合适的布局中,对寄生元件的影响进行了研究和估计。通过蒙特卡罗分析,得到了工艺变化对放大器主要参数的统计分布。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of the Layout Parasitic Effects on the Performance of Current Mode Amplifier Designed Using 32nm CMOS Technology
This paper investigates the influence of layout parasitic RC elements on the main parameters of a current mode amplifier designed in deep sub-micron CMOS technology - 32nm bulk CMOS process. Three distinct layout designs of the same amplifier circuit are implemented and compared by re-simulation. The effect of parasitic elements is investigated and estimated in the most appropriate layout. The statistical distribution of the main amplifier parameters due to process variation is received by Monte Carlo analysis.
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