超结MOSFET体二极管非均匀反向恢复行为的研究

Zhuo Yang, Jing Zhu, Xin Tong, Weifeng Sun, F. Bian, Ye Tian, Yuanzheng Zhu, Peng Ye, Zongqing Li, Bo Hou
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引用次数: 11

摘要

这项工作为全桥逆变器系统在反向恢复行为期间的超结MOSFET (SJ-MOSFET)故障提供了物理见解。对失败的SJ-MOSFET的检查揭示了器件边缘终止附近的烧坏点。为了探索这一结果,进行了物理TCAD模拟。研究发现,SJ-MOSFET的有源区和终端区之间存在极不均匀的反向恢复行为。在末端边缘发生了破坏性的动态雪崩现象,这是造成所观察到的破坏的原因。最后,提出了一种带有P+动态场限制环(DFLR)的优化终端结构来抑制动态雪崩,该结构的反向恢复鲁棒性提高了200%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigations of inhomogeneous reverse recovery behavior of the body diode in superjunction MOSFET
This work provides a physical insight into the failure of Superjunction MOSFET (SJ-MOSFET) for full bridge inverter system during an reverse recovery behavior. The inspection of failed SJ-MOSFET reveals burnt-out points in the vicinity of the device edge termination. To explore this result, physical TCAD simulations have been carried out. It is found that there is an extremely inhomogeneous reverse recovery behavior between the active region and the termination region in the SJ-MOSFET. And a destructive dynamic avalanche phenomenon is occurred at the edge of the termination, which is identified as responsible for the observed failure. Finally, an optimization termination structure with P+ dynamical field limiting ring (DFLR) is proposed to suppress the dynamical avalanche and the reverse recovery robustness of the proposed structure is improved by 200%.
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