{"title":"等离子体材料微波磁控管平均功率供电方案的研究","authors":"S. I. Madveyko","doi":"10.1109/CRMICO.2010.5632840","DOIUrl":null,"url":null,"abstract":"The results of experimental research of plasma radiation optical signal depending on the pressure in the plasmatron chamber, using the different electrical networks of microwave magnetron power supply, are presented.","PeriodicalId":237662,"journal":{"name":"2010 20th International Crimean Conference \"Microwave & Telecommunication Technology\"","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Investigation of variants of power supply schemes for microwave magnetron average power for plasma processing of materials\",\"authors\":\"S. I. Madveyko\",\"doi\":\"10.1109/CRMICO.2010.5632840\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The results of experimental research of plasma radiation optical signal depending on the pressure in the plasmatron chamber, using the different electrical networks of microwave magnetron power supply, are presented.\",\"PeriodicalId\":237662,\"journal\":{\"name\":\"2010 20th International Crimean Conference \\\"Microwave & Telecommunication Technology\\\"\",\"volume\":\"40 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-11-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 20th International Crimean Conference \\\"Microwave & Telecommunication Technology\\\"\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CRMICO.2010.5632840\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 20th International Crimean Conference \"Microwave & Telecommunication Technology\"","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CRMICO.2010.5632840","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Investigation of variants of power supply schemes for microwave magnetron average power for plasma processing of materials
The results of experimental research of plasma radiation optical signal depending on the pressure in the plasmatron chamber, using the different electrical networks of microwave magnetron power supply, are presented.