电子功率放大器中电离辐射引起的退化

N. V. Barbara, peixiong zhao, W. Kerwin
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引用次数: 2

摘要

研究了输出级电离辐射对功率互补mosfet电子功率放大器性能的影响。结果表明,电离辐射对功率mosfet的主要影响是阈值电压的偏移。对于p沟道功率mosfet,这种移位总是负的,而对于n沟道器件,移位的极性取决于部件类型、偏置条件和剂量率。研究发现,如果电离辐射使n通道器件的阈值电压随总剂量的增加而增加,则会导致放大器失效。如果两个功率mosfet都表现出负的阈值电压偏移,则会导致功耗和输出偏置电压的增加。放大器的失效模式取决于p沟道和n沟道功率mosfet中阈值电压移位的相对幅度,以及n沟道器件中移位的极性
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ionizing-radiation-induced degradation in electronic power amplifiers
The effects of ionizing radiation on the performance of electronic power amplifiers with complementary power MOSFETs in the output stage are examined. It is shown that the primary effect of ionizing radiation on power MOSFETs is a shift in the threshold voltage. For p-channel power MOSFETs, this shift is always negative, and for n-channel devices, the polarity of the shift depends on part type, bias conditions, and dose rate. It was found that ionizing radiation leads to failure of the amplifier if the threshold voltage of the n-channel device increases with total dose. If both power MOSFETs exhibit a negative threshold-voltage shift, increases in power dissipation and output offset voltage result. The failure mode of the amplifier depends on the relative magnitude of the threshold-voltage shift in the p- and n-channel power MOSFETs, and on the polarity of the shift in the n-channel device.<>
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