基于0.15 μm栅极长度GaAs pHEMT技术的ka波段单片cpw模式T/R模块

Chia-Shih Cheng, Chien-Cheng Wei, H. Chiu, Y. Chiang, J. Fu, Chia-Song Wu
{"title":"基于0.15 μm栅极长度GaAs pHEMT技术的ka波段单片cpw模式T/R模块","authors":"Chia-Shih Cheng, Chien-Cheng Wei, H. Chiu, Y. Chiang, J. Fu, Chia-Song Wu","doi":"10.1109/GSMM.2008.4534565","DOIUrl":null,"url":null,"abstract":"This paper presents the designs and measurement results of the monolithic coplanar waveguide (CPW) Ka-band millimeter wave integrated circuits, including low noise amplifier, single-balance mixer, power amplifier, and oscillator. The millimeter wave ICs were fabricated with a 0.15 μm T-shape gate GaAs pseudomorphic HEMTs technology, carried out by commercially available foundry. The CPW process was applied in this work to avoid backside process and various impedances can also be adjusted by line width and gap. Therefore, these sub-circuits can be integrated using CPW technology easily and no via-hole process was involved to reduce the process cost.","PeriodicalId":304483,"journal":{"name":"2008 Global Symposium on Millimeter Waves","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"A Ka-Band Monolithic CPW-Mode T/R Modules Using 0.15 μm Gate-Length GaAs pHEMT Technology\",\"authors\":\"Chia-Shih Cheng, Chien-Cheng Wei, H. Chiu, Y. Chiang, J. Fu, Chia-Song Wu\",\"doi\":\"10.1109/GSMM.2008.4534565\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents the designs and measurement results of the monolithic coplanar waveguide (CPW) Ka-band millimeter wave integrated circuits, including low noise amplifier, single-balance mixer, power amplifier, and oscillator. The millimeter wave ICs were fabricated with a 0.15 μm T-shape gate GaAs pseudomorphic HEMTs technology, carried out by commercially available foundry. The CPW process was applied in this work to avoid backside process and various impedances can also be adjusted by line width and gap. Therefore, these sub-circuits can be integrated using CPW technology easily and no via-hole process was involved to reduce the process cost.\",\"PeriodicalId\":304483,\"journal\":{\"name\":\"2008 Global Symposium on Millimeter Waves\",\"volume\":\"27 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-04-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 Global Symposium on Millimeter Waves\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GSMM.2008.4534565\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 Global Symposium on Millimeter Waves","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GSMM.2008.4534565","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

本文介绍了单片共面波导(CPW) ka波段毫米波集成电路的设计和测量结果,包括低噪声放大器、单平衡混频器、功率放大器和振荡器。毫米波集成电路采用0.15 μm t形栅极GaAs伪晶hemt技术,由市产代工厂生产。本工作采用CPW工艺,避免了后侧加工,并可通过线宽和间隙调节各种阻抗。因此,这些子电路可以使用CPW技术轻松集成,并且不涉及过孔工艺,从而降低了工艺成本。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Ka-Band Monolithic CPW-Mode T/R Modules Using 0.15 μm Gate-Length GaAs pHEMT Technology
This paper presents the designs and measurement results of the monolithic coplanar waveguide (CPW) Ka-band millimeter wave integrated circuits, including low noise amplifier, single-balance mixer, power amplifier, and oscillator. The millimeter wave ICs were fabricated with a 0.15 μm T-shape gate GaAs pseudomorphic HEMTs technology, carried out by commercially available foundry. The CPW process was applied in this work to avoid backside process and various impedances can also be adjusted by line width and gap. Therefore, these sub-circuits can be integrated using CPW technology easily and no via-hole process was involved to reduce the process cost.
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