可控添加铋对溅射锡膜中锡晶须的影响

E. K. Snipes, G. Flowers, P. Lall, M. Bozack
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引用次数: 2

摘要

2006年,欧盟将电子产品中的铅(Pb)限制在0.1%(按重量计)以下。这引起了人们对锡晶须的兴趣,因为多年来人们已经知道,在锡薄膜中缺乏Pb会促进锡晶须的生长。早期对Sn晶须的研究表明,Pb以外的元素可能抑制晶须的生长。铋被选为一个有吸引力的候选者,因为它具有与Pb相似的相形成行为,即低溶解度,共晶形成,并且不与Sn形成金属间化合物。本文研究了铋对锡晶须的影响。使用三种定制的含0.5%、1.0%和2.0% Bi(重量比)的Sn-Bi溅射靶,在Si衬底上生成~2000Å溅射Sn薄膜。样品孵育77天。随后,其中三个样品被放置在热循环室中以加速晶须生长,而其他样品继续在实验室条件下孵育。在热循环之前,所有样品的Sn晶须密度都有预期的降低,其中0.5% Bi样品的晶须密度最高(980 cm-2)。然而,在热循环后,所有的样品都发生了戏剧性的胡须爆炸。结果清楚地表明,少量的铋显著降低了Sn晶须的数量,但仅在等温、室温条件下。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence on Sn whiskering of controlled bismuth additions to sputtered Sn films
In 2006, the European Union restricted lead (Pb) to > 0.1% (by weight) in electronics. This caused a renewal of interest in Sn whiskers, as the absence of Pb in Sn films had been known for years to promote Sn whisker growth. The early work on Sn whiskers had suggested that elements other than Pb may suppress whiskers. Bi was chosen as an attractive candidate, as it has similar phase formation behavior to Pb, i.e., low solubility, eutectic formation, and no intermetallic compounds with Sn. In this work, the influence of Bi on Sn whiskering is investigated. Three custom Sn-Bi sputter targets with 0.5%, 1.0%, and 2.0% Bi (by weight) were used to generate ~2000Å sputtered Sn films on Si substrates. The samples were incubated for 77 days. Subsequently, three of the samples were placed in a thermal cycling chamber to accelerate whisker growth, while the others continued to incubate under lab conditions. An expected reduction in Sn whisker density was observed on all samples prior to thermal cycling, with the 0.5% Bi samples generating the highest whisker densities (980 cm-2). A dramatic explosion of whiskering occurred, however, in all the specimens after thermal cycling. The results clearly show that small amounts of Bi dramatically lowers the amount of Sn whiskering, but only under isothermal, room temperature conditions.
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