金属辅助化学蚀刻硅纳米线的合成及光致发光研究

E. Fakhri, M. T. Sultan, A. Manolescu, S. Ingvarsson, N. Plugaru, R. Plugaru, H. Svavarsson
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引用次数: 3

摘要

硅纳米线在光电子学和基于硅纳米线的光学传感器中具有潜在的应用前景。本文介绍了用简单的银催化两步蚀刻硅片制备的SiNW阵列的光致发光研究。研究了不同银浓度(硝酸银、AgNO3)和蚀刻时间制备的不同长度SiNWs的形貌和光致发光性能。样品由垂直排列的sinw组成,长度在~10-40µm之间。我们最重要的结果是SiNW阵列的光致发光强度比体硅高一个数量级。这伴随着峰值位置约0.09 eV的红移,这可能归因于在蚀刻过程中产生的银纳米颗粒的大小变化或SiNWs的不同长度。结果表明,通过简单而经济的金属催化蚀刻获得的SiNWs具有潜在的光电应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Synthesis and photoluminescence study of silicon nanowires obtained by metal assisted chemical etching
Silicon nanowires (SiNWs) hold potential applications in optoelectronics and SiNW-based optical sensors. Here, a photoluminescence study of SiNW arrays fabricated with a simple two-step silver (Ag) catalyzed etching of silicon wafers is presented. The morphology and photoluminescence properties were investigated for SiNWs of different lengths obtained by varying Ag concentration (as silver nitrate, AgNO3) and etching time. The samples consist of vertically aligned SiNWs with length in the range ~10-40 µm. Our foremost result is that the photoluminescence intensity from the SiNW arrays is an order of magnitude higher than that from bulk Si. This is accompanied by a red-shift in the peak position of approximately 0.09 eV, which may be attributed either to the variation in size of the Ag-nanoparticles created during the etching process or different lengths of the SiNWs. The results indicate that SiNWs obtained by simple and cost-effective metal catalyzed etching, are potentially promising for optoelectronic applications.
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