高数值孔径聚焦系统中用于二维强度合成的瞳孔掩模

Southeast Asian International Advances in Micro/Nano-technology Pub Date : 2010-05-19 DOI:10.1117/12.863847

Leelada Rattanavija, S. Sherif, W. Mohammed

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引用次数: 0

摘要

高数值孔径(NA)透镜用于许多需要紧密聚焦光束的应用，包括显微镜。德拜-沃尔夫电磁衍射积分描述了高NA透镜的聚焦。利用该积分的本征函数展开，我们在数值上得到了一个瞳孔掩模，该掩模在高斯焦平面上产生任意的，在衍射极限内的强度分布。

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Pupil masks for 2-D intensity synthesis in a high numerical aperture focusing system

A high numerical aperture (NA) lens is used in many applications that require tightly focused beams including microscopy. The Debye-Wolf electromagnetic diffraction integral describes focusing by high NA lenses. Using an eigenfunction expansion of this integral, we numerically obtain a pupil mask that generates an arbitrary, within the diffraction limit, intensity distribution at the Gaussian focal plane.

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Southeast Asian International Advances in Micro/Nano-technology

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