一种3nm GAAFET模拟辅助数字LDO,具有高电流密度,用于动态电压缩放移动应用

Seki Kim, Hyongmin Lee, Yongjin Lee, Dongha Lee, Byeongbae Lee, Jahoon Jin, Susie Kim, Miri Noh, K. Kang, Sangho Kim, Takahiro Nomiyama, Ji-Seon Paek, Jongwoo Lee
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引用次数: 2

摘要

本文提出了一种模拟辅助数字LDO,具有高电流密度和快速响应特性。基于电流比较器的控制方法使数字电流比模拟电流超过10倍,无论PVT条件如何,都能实现高电流密度。采用3nm GAAFET CMOS技术的LDO在1A/1ns负载电流条件下电流密度为34.15A/mm2,瞬态特性为38mV。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 3nm GAAFET Analog Assisted Digital LDO with High Current Density for Dynamic Voltage Scaling Mobile Applications
This paper presents an analog assisted digital LDO achieving high current density and fast response characteristic. A current comparator based control method enables over 10x ratio of digital current over analog current for high current density regardless of PVT condition. The proposed LDO in 3nm GAAFET CMOS technology demonstrated current density of 34.15A/mm2 and fast transient characteristic of 38mV droop at 1A/1ns load current condition.
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