{"title":"光簇生产率的提高","authors":"Sharon Sisler","doi":"10.1109/ASMC.1996.557963","DOIUrl":null,"url":null,"abstract":"This paper describes improvements being implemented in a multi-technology, multi-partnumber IBM semiconductor fabricator to increase photocluster output. The work of various teams is presented, which have generated a host of enhancements, including a customized logistics system, host computer control, continuous lot chaining, a work-in-process (WIP) and reticle tracking system, area alarms for tool stoppages, staffing based on activity analysis, operator coverage improvements guided by delays determined from host control data and alignment assist reductions guided by host control data. Photocluster productivity has increased 35% since these changes were begun and more improvement is anticipated.","PeriodicalId":325204,"journal":{"name":"IEEE/SEMI 1996 Advanced Semiconductor Manufacturing Conference and Workshop. Theme-Innovative Approaches to Growth in the Semiconductor Industry. ASMC 96 Proceedings","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Photocluster productivity improvement\",\"authors\":\"Sharon Sisler\",\"doi\":\"10.1109/ASMC.1996.557963\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes improvements being implemented in a multi-technology, multi-partnumber IBM semiconductor fabricator to increase photocluster output. The work of various teams is presented, which have generated a host of enhancements, including a customized logistics system, host computer control, continuous lot chaining, a work-in-process (WIP) and reticle tracking system, area alarms for tool stoppages, staffing based on activity analysis, operator coverage improvements guided by delays determined from host control data and alignment assist reductions guided by host control data. Photocluster productivity has increased 35% since these changes were begun and more improvement is anticipated.\",\"PeriodicalId\":325204,\"journal\":{\"name\":\"IEEE/SEMI 1996 Advanced Semiconductor Manufacturing Conference and Workshop. Theme-Innovative Approaches to Growth in the Semiconductor Industry. ASMC 96 Proceedings\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-11-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/SEMI 1996 Advanced Semiconductor Manufacturing Conference and Workshop. Theme-Innovative Approaches to Growth in the Semiconductor Industry. ASMC 96 Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1996.557963\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI 1996 Advanced Semiconductor Manufacturing Conference and Workshop. Theme-Innovative Approaches to Growth in the Semiconductor Industry. ASMC 96 Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1996.557963","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
This paper describes improvements being implemented in a multi-technology, multi-partnumber IBM semiconductor fabricator to increase photocluster output. The work of various teams is presented, which have generated a host of enhancements, including a customized logistics system, host computer control, continuous lot chaining, a work-in-process (WIP) and reticle tracking system, area alarms for tool stoppages, staffing based on activity analysis, operator coverage improvements guided by delays determined from host control data and alignment assist reductions guided by host control data. Photocluster productivity has increased 35% since these changes were begun and more improvement is anticipated.
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