室温脉冲激光在玻璃基板上制备Na0.5K0.5NbO3薄膜

Weiping Zhou, Furong Liu, Chao He, Jimin Chen
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引用次数: 0

摘要

本文提出了一种制备无铅铌酸钾钠[(K,Na)NbO3,KNN]压电薄膜的新方法。利用脉冲激光在室温下直接在玻璃基板上烧结KNN薄膜。所有的步骤都不需要真空条件。与rf磁控溅射和金属有机化学气相沉积(MOCVD)等传统制备技术相比,该方法更简单、更快。利用扫描电子显微镜(SEM)观察了KNN薄膜的表面形貌,并用x射线衍射仪(XRD)对其相组成和结构进行了表征。结果表明,该方法制备的KNN薄膜是成功的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication of Na0.5K0.5NbO3 Thin Film on Glass Substrate by Pulsed Laser at Room Temperature
In this paper, a novel method of fabricate lead-free piezoelectric sodium potassium niobate [(K,Na)NbO3,KNN] thin films was proposed. The KNN thin films were directly sintered on glass substrate at room temperature by pulsed laser. And all of the steps do not need vacuum conditions. Compared with conventional preparation techniques, such as RF-magnetron sputtering and metal-organic chemical vapor deposition (MOCVD), this method is more simpler and faster. The surface morphology of KNN thin film was observed with scanning electron microscopy (SEM), phase composition and structure were characterized by X-ray diffraction (XRD). These results indicate that the KNN thin film was succeeded fabricated by the method.
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