纳米超薄体肖特基势垒mosfet射频性能的蒙特卡罗模拟研究

Z. Xia, G. Du, Xiaoyan Liu, Jinfeng Kang, R. Han
{"title":"纳米超薄体肖特基势垒mosfet射频性能的蒙特卡罗模拟研究","authors":"Z. Xia, G. Du, Xiaoyan Liu, Jinfeng Kang, R. Han","doi":"10.1109/EDSSC.2005.1635268","DOIUrl":null,"url":null,"abstract":"A Monte Carlo investigation of the dynamic performance of nano-scale ultra-thin-body (UTB) Schottky-Barrier MOSFETs (SB-MOSFETs) is presented. A thorough account of how the gate voltage and SB barrier height affect the RF performance of UTB SB-MOSFETs is elaborated. The UTB SB-MOSFET offers excellent RF performance with high values of fTand fmax. The peak fTis higher than 600 GHz with SB height ranging from 0.2eV to 0.3eV. It is found that gate voltage has a significant influence on fTand fmaxof UTB SB-MOSFETs whereas the barrier height is of minor importance. However, both gate voltage and SB height affect the gmand gdsobviously. For high performance of UTB SB-MOSFETs, appropriate gate voltage and SB height is of great importance.","PeriodicalId":429314,"journal":{"name":"2005 IEEE Conference on Electron Devices and Solid-State Circuits","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Investigation of RF Performance of Nano-Scale Ultra-Thin-Body Schottky-Barrier MOSFETs Using Monte Carlo Simulation\",\"authors\":\"Z. Xia, G. Du, Xiaoyan Liu, Jinfeng Kang, R. Han\",\"doi\":\"10.1109/EDSSC.2005.1635268\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A Monte Carlo investigation of the dynamic performance of nano-scale ultra-thin-body (UTB) Schottky-Barrier MOSFETs (SB-MOSFETs) is presented. A thorough account of how the gate voltage and SB barrier height affect the RF performance of UTB SB-MOSFETs is elaborated. The UTB SB-MOSFET offers excellent RF performance with high values of fTand fmax. The peak fTis higher than 600 GHz with SB height ranging from 0.2eV to 0.3eV. It is found that gate voltage has a significant influence on fTand fmaxof UTB SB-MOSFETs whereas the barrier height is of minor importance. However, both gate voltage and SB height affect the gmand gdsobviously. For high performance of UTB SB-MOSFETs, appropriate gate voltage and SB height is of great importance.\",\"PeriodicalId\":429314,\"journal\":{\"name\":\"2005 IEEE Conference on Electron Devices and Solid-State Circuits\",\"volume\":\"17 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-12-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 IEEE Conference on Electron Devices and Solid-State Circuits\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDSSC.2005.1635268\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE Conference on Electron Devices and Solid-State Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDSSC.2005.1635268","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

采用蒙特卡罗方法研究了纳米超薄体肖特基势垒mosfet (sb - mosfet)的动态性能。详细阐述了栅极电压和SB势垒高度如何影响UTB SB- mosfet的射频性能。UTB SB-MOSFET具有优异的RF性能,具有较高的ftd和fmax值。峰值fTis高于600 GHz, SB高度在0.2eV ~ 0.3eV之间。发现栅极电压对UTB sb - mosfet的fand fmax有显著影响,而势垒高度的影响较小。而栅极电压和SB高度对栅极电压和栅极电压均有明显的影响。对于UTB SB- mosfet的高性能,合适的栅极电压和SB高度是非常重要的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of RF Performance of Nano-Scale Ultra-Thin-Body Schottky-Barrier MOSFETs Using Monte Carlo Simulation
A Monte Carlo investigation of the dynamic performance of nano-scale ultra-thin-body (UTB) Schottky-Barrier MOSFETs (SB-MOSFETs) is presented. A thorough account of how the gate voltage and SB barrier height affect the RF performance of UTB SB-MOSFETs is elaborated. The UTB SB-MOSFET offers excellent RF performance with high values of fTand fmax. The peak fTis higher than 600 GHz with SB height ranging from 0.2eV to 0.3eV. It is found that gate voltage has a significant influence on fTand fmaxof UTB SB-MOSFETs whereas the barrier height is of minor importance. However, both gate voltage and SB height affect the gmand gdsobviously. For high performance of UTB SB-MOSFETs, appropriate gate voltage and SB height is of great importance.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信