5nm节点多vt FD-SOI 6T-SRAM体偏置辅助vmin优化

Jheng-Yi Chen, Ming-Yu Chang, Shi-Hao Chen, Jia-Wei Lee, M. Chiang
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引用次数: 0

摘要

本文提出了一种基于5nm节点多vt FD-SOI器件的6T-SRAM Vmin优化的体偏置技术。考虑到工艺变化,工作电压Vmin估计为6西格玛产量。通过正确选择反向偏置,可以在高性能、标准和低压三种工作模式中实现最低的Vmin。在高性能模式下,在0.2 V的背偏置下,优化后的Vmin降至0.491 V。该技术为优化SRAM性能和良率提供了设计灵活性,通过调整背偏,而无需复杂的工艺技术要求。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Body-biasing assisted vmin optimization for 5nm-node multi-Vt FD-SOI 6T-SRAM
This work proposes a body-biasing technique to optimize Vmin of the 6T-SRAM based on 5nm-node multi-Vt FD-SOI devices. Accounting for the process variation, the operating voltage, Vmin, is estimated at 6-sigma yield. By properly selecting the back bias, the lowest Vmin is achieved for each of the three operation modes: high-performance, standard and low-voltage modes. In high-performance mode, the optimized Vmin is reduced to 0.491 V at back bias of 0.2 V. The proposed technique offers a design flexibility for optimizing the SRAM performance and yield by adjusting the back bias without complicated process technology requirements.
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