中国企业所得税减免刺激研发投资

Zhao Chen, Zhikuo Liu, Juan Carlos Suárez Serrato, Daniel Yi Xu
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引用次数: 166

摘要

我们研究了中国的一项政策,该政策对研发投资超过一定门槛或“缺口”的公司给予大幅减税。准实验变量和行政税收数据显示,报告的研发支出显著增加,部分原因是企业将费用重新贴上研发标签。结构性估计显示,重新贴标签占报告研发的24.2%,研发翻倍将使生产率提高9%。政策模拟表明,企业选择和重新贴标签决定了刺激研发的成本效益,当重新贴标签普遍存在时,基于缺口的政策比税收抵免更有效,从福利的角度来看,适度的溢出效应证明了该计划的合理性。(凝胶d22, d24, h25, o14, o32, p31, p35)
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Notching R&D Investment with Corporate Income Tax Cuts in China
We study a Chinese policy that awards substantial tax cuts to firms with R&D investment over a threshold or “notch.” Quasi-experimental variation and administrative tax data show a significant increase in reported R&D that is partly driven by firms relabeling expenses as R&D. Structural estimates show relabeling accounts for 24.2 percent of reported R&D and that doubling R&D would increase productivity by 9 percent. Policy simulations show that firm selection and relabeling determine the cost-effectiveness of stimulating R&D, that notch-based policies are more effective than tax credits when relabeling is prevalent, and that modest spillovers justify the program from a welfare perspective. (JEL D22, D24, H25, O14, O32, P31, P35)
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