新型纳米级CMOS锁存器软误差硬化设计

Haiqing Nan, K. Choi
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引用次数: 15

摘要

随着CMOS技术的缩小,电源电压和栅极电容降低,导致每个节点的电荷存储容量降低,并且在辐射环境中对外界噪声的敏感性增加。本文提出了一种新的硬化锁存器设计,并与以往采用32nm技术节点的硬化锁存器设计进行了比较。利用HSPICE进行的大量仿真结果表明,与最新的强化锁存器设计相比,所提出的强化锁存器设计实现了15倍的临界电荷(Qcrit)提高和6倍的电荷与功率延迟积比(QPR)提高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Novel soft error hardening design of Nanoscale CMOS latch
As CMOS technology is scaled down, the supply voltage and gate capacitance are reduced, which results in the reduction of charge storing capacity at each node and increase of the susceptibility to external noise in radiation environments. In this paper, a novel hardened latch design is proposed and compared with the previous hardened latch designs using 32nm technology node. Extensive simulation results using HSPICE are reported to show that the proposed hardened latch design achieves 15X improvement of critical charge (Qcrit) and 6X improvement of charge to power delay product ratio (QPR) compared to the most up to date hardened latch design.
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