Structure verification on photolithographic masks based on tolerance criteria by cellular neural networks

First of all, the problem of structure verification is introduced with respect to tolerance criteria and their verifications. After that, the basic principle of a verification method for cellular neural networks is motivated by means of local restrictions. Then their solution is presented on the basis of local operators which are only designed with the help of local restrictions of the design rules of the mask structures and their tolerance zones. After that, the result of the successful use of the method is demonstrated on manufacturing and calibration masks. Finally, the debate discusses the competitive position of the method with reference to two standard methods. Last of all, the summary indicates future improvements.