单电子存储器——一个数学模型

R. Khalid, M.M. Ahmed
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引用次数: 0

摘要

单电子存储器(SEM)由于具有超大规模集成的前景而受到了研究界的广泛关注。室温扫描电镜必须在纳米尺度上制造,并且需要对其建模进行量子力学处理。我们建立了一个电子隧穿到单隧道结SEM的存储节点的半经典数学模型。我们使用了一维薛定谔方程以及基本统计物理和电磁学。我们继续假设通道(储层)电子是一个非相互作用的自由电子系统,并展示了施加偏置如何增加电子隧穿的概率。我们已经将该模型应用于Futatsugi等人(1998)报道的扫描电镜,并发现它与隧道跃迁发生的电压方面的上述特征非常吻合
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Single electron memory - a mathematical model
Single electron memory (SEM) has received a lot of interest in research circles because of its promise for ultra-large scale integration. Room temperature SEM have to be fabricated at the nanometer scale and require a quantum mechanical treatment for their modeling. We have developed a semi-classical mathematical model for an electron tunneling into the memory node of a single tunnel junction SEM. We have used the 1D Schrodinger equation and elementary statistical physics and electromagnetics. We proceed by assuming the channel (reservoir) electrons to be a non-interacting free electron system, and show how an applied bias can increase the probability of electron tunneling. We have applied the model to an SEM reported in Futatsugi et al. (1998) and have found it to be in excellent agreement with the said characteristics with respect to the voltage at which a tunneling transition should take place
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