T. Koyama, H. Yumoto, K. Tono, T. Togashi, Y. Inubushi, T. Katayama, Jangwoo Kim, S. Matsuyama, M. Yabashi, K. Yamauchi, H. Ohashi
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Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation
X-ray free-electron lasers (XFELs) that utilize intense and ultra-short pulse X-rays may damage optical elements. We investigated the damage fluence thresholds of optical materials by using an XFEL focusing beam that had a power density sufficient to induce ablation phenomena. The 1 μm focusing beams with 5.5 keV and/or 10 keV photon energies were produced at the XFEL facility SACLA (SPring-8 Angstrom Compact free electron LAser). Test samples were irradiated with the focusing beams under normal and/or grazing incidence conditions. The samples were uncoated Si, synthetic silica glass (SiO2), and metal (Rh, Pt)-coated substrates, which are often used as X-ray mirror materials.
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