具有沟槽和自对准肖特基栅结构的gaas基RTT的设计、制造和表征

Wei-lian Guo, P. Niu, Xiao-yun Li, Chang-yun Miao, Wei Wang, Xin Yu, Yaoyao Shang, Zhen Feng, Guoping Tian, Yali Li, Yongqiang Liu, Mingwen Yuan, Xiao-Bai Li
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引用次数: 0

摘要

本文全面系统地介绍了具有沟槽和自对准栅极结构的砷化镓谐振隧道晶体管(RTT)的材料结构和器件结构的设计、制作工艺和表征。峰谷电流比(PVCR)最大值为46,跨导gm在1.3~8.0 ms范围内,截止频率fTgm为1.59 GHz,速度指数S为13.5 ps/V。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The design, fabrication and characterization of GaAs-based RTT with groove and self-aligned Schottky gate structure
In this paper, the design of material structure and device structure , fabrication processing and characterization on GaAs based Resonant Tunneling Transistor (RTT) with groove and self-aligned gate structure have been described completely and systematically .The experimental results measured from our fabricated RTT show that : the maximum value of Peak to Valley Current Ratio (PVCR) is 46, the transconductance gm is in a range of 1.3~8.0 ms, the cutoff frequency fTgm and speed index S are 1.59 GHz and 13.5 ps/V respectively .
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