用于混频器的65纳米CMOS工艺中对称变容管的双端口表征

Saad Azmeen-ur-Rahman, M. Hasna, S. Ekin, W. Choi
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引用次数: 0

摘要

采用65纳米CMOS工艺,设计并制备了两端口的累积模式MOS对称变容管(SVAR)。SVAR由一个n型变容器(n-VAR)和一个p型变容器(p-VAR)组成,它们的门组合到端口1。端口2连接n-VAR的n-井。2端口SVAR为中频信号注入提供了额外的路径,可以简化并潜在地改善射频到中频之间的隔离结构。还设计了一个1端口p-VAR测试结构来验证其操作。SVAR的动态截止频率提取为505 GHz, 2端口测量高达40 GHz。该SVAR在40ghz时的品质因数大于21,最大/最小电容比为1.4。SVAR的n孔端口在10ghz时的质量因数为30。对p-VAR的1端口测量表明,p型变容管的电容比n-VAR小19%左右。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Two-Port Characterization of Symmetric Varactors in 65-nm CMOS Process for Mixer Applications
Accumulation-mode MOS symmetric varactors (SVAR) with two ports are designed and fabricated in a 65-nm CMOS process. The SVAR is composed of an n-type varactor (n-VAR) and a p-type varactor (p-VAR) with their gates combined to port 1. Port 2 is connected to the n-well of the n-VAR. The 2-port SVAR provides an additional path for IF signal injection, which can simplify and potentially improve the isolation structure between RF to IF. A 1-port p-VAR test structure is also designed to verify its operation. The dynamic cut-off frequency of the SVAR is extracted to be 505 GHz with 2-port measurements up to 40 GHz. The SVAR exhibits a quality factor greater than 21 at 40 GHz and a maximum-to-minimum capacitance ratio of 1.4. The n-well port of the SVAR has a quality factor of 30 at 10 GHz. 1-port measurements of the p-VAR show that the capacitance of the p-type varactor is about 19% smaller than that of the n-VAR.
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