{"title":"采用片上加热和计算机控制测试的测试芯片的无烤箱电迁移测试系统环境","authors":"V. Tyree","doi":"10.1109/ICMTS.1990.161751","DOIUrl":null,"url":null,"abstract":"An electromigration test environment and test chip has been developed that permits standard ASTM electromigration testing to be conducted without the use of an oven or high-temperature rated test fixtures. More accurate temperature control is possible while simultaneously permitting multiple acceleration factors (temperature/current) to be running at the same time. On the research side, it is possible to reanalyze the resistance history data to select appropriate failure criteria and to optically monitor the electromigration tests in progress to observe formation of hillocks and voids as the test progresses. In a production application it permits higher test temperatures to reduce testing time without the associated high cost of high-temperature test fixtures.<<ETX>>","PeriodicalId":417292,"journal":{"name":"Proceedings of the 1991 International Conference on Microelectronic Test Structures","volume":"81 4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-03-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"An ovenless electromigration test system environment using test chips with on-chip heating and computer controlled testing\",\"authors\":\"V. Tyree\",\"doi\":\"10.1109/ICMTS.1990.161751\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An electromigration test environment and test chip has been developed that permits standard ASTM electromigration testing to be conducted without the use of an oven or high-temperature rated test fixtures. More accurate temperature control is possible while simultaneously permitting multiple acceleration factors (temperature/current) to be running at the same time. On the research side, it is possible to reanalyze the resistance history data to select appropriate failure criteria and to optically monitor the electromigration tests in progress to observe formation of hillocks and voids as the test progresses. In a production application it permits higher test temperatures to reduce testing time without the associated high cost of high-temperature test fixtures.<<ETX>>\",\"PeriodicalId\":417292,\"journal\":{\"name\":\"Proceedings of the 1991 International Conference on Microelectronic Test Structures\",\"volume\":\"81 4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-03-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 1991 International Conference on Microelectronic Test Structures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.1990.161751\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 1991 International Conference on Microelectronic Test Structures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.1990.161751","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An ovenless electromigration test system environment using test chips with on-chip heating and computer controlled testing
An electromigration test environment and test chip has been developed that permits standard ASTM electromigration testing to be conducted without the use of an oven or high-temperature rated test fixtures. More accurate temperature control is possible while simultaneously permitting multiple acceleration factors (temperature/current) to be running at the same time. On the research side, it is possible to reanalyze the resistance history data to select appropriate failure criteria and to optically monitor the electromigration tests in progress to observe formation of hillocks and voids as the test progresses. In a production application it permits higher test temperatures to reduce testing time without the associated high cost of high-temperature test fixtures.<>