通过光照约束的绘画去除高光

P. Tan, Stephen Lin, Long Quan, H. Shum
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引用次数: 121

摘要

我们提出了一种单幅图像高光去除方法,该方法将基于光照的约束结合到图像绘制中。与传统补漆填充的闭塞图像区域不同,高亮像素包含一些有用的信息,可以指导补漆过程。我们的方法利用了观测像素颜色、高光颜色分析和照明颜色均匀性提供的约束来改进底层漫反射颜色的估计。这些光照约束的包含允许更好地恢复阴影和纹理通过油漆。实验结果验证了该方法的有效性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Highlight removal by illumination-constrained inpainting
We present a single-image highlight removal method that incorporates illumination-based constraints into image inpainting. Unlike occluded image regions filled by traditional inpainting, highlight pixels contain some useful information for guiding the inpainting process. Constraints provided by observed pixel colors, highlight color analysis and illumination color uniformity are employed in our method to improve estimation of the underlying diffuse color. The inclusion of these illumination constraints allows for better recovery of shading and textures by inpainting. Experimental results are given to demonstrate the performance of our method.
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