高阶偏振-倒ScAlN薄膜谐振器的功率耐久性评价

Saneyuki Shibata, T. Yanagitani
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引用次数: 0

摘要

与4G相比,5G通信需要大量的射频基站,因为它们的频率很高。将现有的大型介质谐振器滤波器替换为BAW滤波器是减少射频基站的解决方案之一。1w的电量耐久性对于智能手机来说已经足够了。然而,射频基站需要几十瓦的功率耐久性。高n阶谐振运算可用于n阶极化反转多层。反极化多层谐振器的n倍厚度和n倍大面积(由于50 Ω匹配)使BAW器件能够提高功率耐用性。在本研究中,我们制作了一层和四层薄膜反极化ScAlN固体安装谐振器(SMR)。比较了这些器件的功率耐久性。180mw的4层ScAlN膜的功率耐久性比30mw的1层ScAlN膜高6倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Power Durability Evaluation of Higher-Order Mode Polarization-Inverted ScAlN Thin Film Resonators
A number of RF base stations are required for 5G communication compared with 4G because of their high frequency operation. One of the solutions to minimize the RF base stations is to replace the current large dielectric resonator filters with BAW filters. The power durability of 1 W is sufficient for smartphones. However, the power durability of tens of watts is required for RF base stations. High n-th order resonance operation is available for n-th polarization-inverted multilayers. n-Fold thick and n-fold large area (due to 50 Ω matching) in polarization-inverted multilayered resonator enables BAW devices to improve power durability. In this study, we fabricated polarization-inverted ScAlN 1-layer and 4-layer thin films solidly mounted resonator (SMR). The power durability of these devices was compared. The power durability of the 4-layered ScAlN film of 180 mW was 6-times higher than that of the 1-layered ScAlN film of 30 mW.
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