间隔层生长温度对量子点激光结构光学性质的影响

N. F. Hasbullah, J. S. Ng, H. Liu, M. Hopkinson, J. David, T. Badcock, D. Mowbray, A. Sanchez, R. Beanland
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引用次数: 1

摘要

本文研究了嵌入在In0.15Ga0.85As量子阱中的InAs量子点的电致发光(EL)及其与温度的关系,并将其作为GaAs间隔层生长温度的函数。随着隔离剂生长温度的升高,室温下的电致发光强度增大。在室温下,所有样品的综合EL强度随注入电流的变化表明,在低电流下,梯度呈超线性,但随着间隔片生长温度的升高,这种超线性减小。通过对生成-重组速率方程的简单分析,可以表明,这种超线性源于非辐射重组是主要的重组过程。随着间隔层生长温度的升高,这种非辐射复合变得不那么占优势。通过对EL强度温度依赖性的Arrhenius图得出,在高温下的活化能为~300±15 meV。因此,主要的损失机制是电子从量子点基态逃逸到砷化镓势垒。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effects of spacer growth temperature on the optical properties of quantum dot laser structures
Electroluminescence (EL) and its temperature dependence of InAs quantum dots embedded in In0.15Ga0.85As quantum well [dots in a well (DWELL)] have been investigated as functions of the growth temperature of the GaAs spacer layer. The EL intensity at room temperature increases as the spacer growth temperature increases. The integrated EL intensity as a function of injection current at room temperature for all samples shows that at low currents, the gradients are superlinear but this superlinearity decreases as the spacer growth temperature is increased. From a simple analysis of the generation-recombination rate equations, it can be shown that the superlinearity stems from the nonradiative recombination being the dominant recombination process. As the spacer growth temperature is increased, this nonradiative recombination become less dominant. An Arrhenius plot of the temperature dependence of the EL intensity gives an activation energy of ~300 ± 15 meV at high temperature. The dominant loss mechanism is therefore concluded to be the electron escape from the quantum dot ground state to the GaAs barrier.
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