F层和AF层之间的间接交换交互

P. Kim, Y. Yoo, S. Yu, I. A. Turpanov, D. L. Khalyapin, D.A. Maruschenko, J. Yun, J. Rhee
{"title":"F层和AF层之间的间接交换交互","authors":"P. Kim, Y. Yoo, S. Yu, I. A. Turpanov, D. L. Khalyapin, D.A. Maruschenko, J. Yun, J. Rhee","doi":"10.1109/INTMAG.2006.376342","DOIUrl":null,"url":null,"abstract":"In this work we represent a comprehensive study of indirect exchange coupling between ferromagnetic (F) and antiferromagnetic (AF) layers carried out on NiFe(5 nm)/Cu(d)/IrMn(10 nm) thin film structure. NiFe/Cu/IrMn films were fabricated by magnetron sputtering with a seed and a capping layers of Ta(5nm). The thickness d of the Cu spacer was varied from 0.2 nm to 2 nm. The Cu spacer thickness was carefully controlled by sputter condition and the thickness was confirmed by cross sectional transmission electron microscopy (TEM) and Auger depth profile.","PeriodicalId":262607,"journal":{"name":"INTERMAG 2006 - IEEE International Magnetics Conference","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Indirect Exchange Interaction between F and AF Layers\",\"authors\":\"P. Kim, Y. Yoo, S. Yu, I. A. Turpanov, D. L. Khalyapin, D.A. Maruschenko, J. Yun, J. Rhee\",\"doi\":\"10.1109/INTMAG.2006.376342\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work we represent a comprehensive study of indirect exchange coupling between ferromagnetic (F) and antiferromagnetic (AF) layers carried out on NiFe(5 nm)/Cu(d)/IrMn(10 nm) thin film structure. NiFe/Cu/IrMn films were fabricated by magnetron sputtering with a seed and a capping layers of Ta(5nm). The thickness d of the Cu spacer was varied from 0.2 nm to 2 nm. The Cu spacer thickness was carefully controlled by sputter condition and the thickness was confirmed by cross sectional transmission electron microscopy (TEM) and Auger depth profile.\",\"PeriodicalId\":262607,\"journal\":{\"name\":\"INTERMAG 2006 - IEEE International Magnetics Conference\",\"volume\":\"17 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-05-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"INTERMAG 2006 - IEEE International Magnetics Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/INTMAG.2006.376342\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"INTERMAG 2006 - IEEE International Magnetics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INTMAG.2006.376342","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

在这项工作中,我们代表了在NiFe(5 nm)/Cu(d)/IrMn(10 nm)薄膜结构上进行的铁磁(F)和反铁磁(AF)层之间间接交换耦合的全面研究。采用磁控溅射法制备了NiFe/Cu/IrMn薄膜,并在薄膜上覆盖了5nm的Ta层。铜间隔层的厚度d在0.2 ~ 2 nm之间变化。利用溅射条件对铜衬垫厚度进行了严格控制,并用透射电镜(TEM)和俄歇深度剖面对其厚度进行了验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Indirect Exchange Interaction between F and AF Layers
In this work we represent a comprehensive study of indirect exchange coupling between ferromagnetic (F) and antiferromagnetic (AF) layers carried out on NiFe(5 nm)/Cu(d)/IrMn(10 nm) thin film structure. NiFe/Cu/IrMn films were fabricated by magnetron sputtering with a seed and a capping layers of Ta(5nm). The thickness d of the Cu spacer was varied from 0.2 nm to 2 nm. The Cu spacer thickness was carefully controlled by sputter condition and the thickness was confirmed by cross sectional transmission electron microscopy (TEM) and Auger depth profile.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信