高密度互连和封装高温变形的云纹干涉/有限元混合方法

Jiansen Zhu, D. Zou, F. Dai, Sheng Liu, Yi Guo
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引用次数: 7

摘要

在目前的研究中,1200个I/mm光栅或600个1/mm光栅在80/spl度/C或160/spl度/C的温度下复制到几个高密度区域互连和封装的横截面上。这些封装包括BGA、倒装芯片和全球通顶封装。在室温下测量了试样在冷却过程中引起的热变形。采用云纹干涉法和实验/有限元混合方法分析了焊点内部的应变分布。测量了封装系统的翘曲,并讨论了粘合、封装、焊接和几何形状对变形的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High temperature deformation of high density interconnects and packages by moire interferometry/FEM hybrid method
In the current study, 1200 I/mm grating or 600 1/mm gratings are replicated at either 80/spl deg/C or 160/spl deg/C onto the cross sections of several high density area interconnects and packages. These packages include BGA, flip-chip, and glob-top packages. The specimens are measured at room temperature for the thermal deformation induced by the cooling process. The strain distributions inside the solder joints are analyzed by both the moire interferometry and experimental/FEM hybrid method. Warpage of the packaging systems was measured and the effects of the bonding, encapsulation, soldering, and geometry on the deformation are discussed.
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